A Random Walk Approach for Light Scattering in Material

Klaus Simon (1) , Beat Trachsler (1)

1 EMPA - Swiss Federal Laboratories for Materials Science and Technology [Thun]

Understanding reflection is one of the key competences in graphic arts industry. A very popular approach was given by Kubelka andMunk [1931] who derived a simple relationship between the scattering and absorption coefficients and the overall reflectance. This paper presents an alternative approach which describes the behavior of light in matter as a special kind of random walk.

Mots clés: Random Walk; Kubelka-Munk; Light Scattering; First-Passage Time Probability; Narayana Numbers; Catalan Numbers; Chebyshev Polynomials

Domaines: Algorithme et structure de données [cs.DS]; Mathématique discrète [cs.DM]; Combinatoire [math.CO]; Géométrie algorithmique [cs.CG]

Klaus Simon, Beat Trachsler. A Random Walk Approach for Light Scattering in Material. Discrete Random Walks, DRW'03, 2003, Paris, France. pp.289-300, ⟨10.46298/dmtcs.3333⟩. ⟨hal-01183928⟩