Ultrahigh-intensity laser-produced plasmas as a compact heavy ion injection source

K. Krushelnick (1) , E.L. Clark , R. Allott , F.N. Beg , C.N. Danson (2) , A. Machacek , Victor Malka (3) , Z. Najmudin (4) , D. Neely (5) , P.A. Norreys (2) , M.R. Salvati , M.I.K. Santala (4) , M. Tatarakis , I. Watts , M. Zepf , A.E. Dangor (4)

1 CUOS - Center for Ultrafast Optical Sciences
2 CLF - Central Laser Facility
3 LULI - Laboratoire pour l'utilisation des lasers intenses
4 Blackett Laboratory
5 RAL - STFC Rutherford Appleton Laboratory

Domaines: Physique des accélérateurs [physics.acc-ph]; Optique [physics.optics]; Physique des plasmas [physics.plasm-ph]

K. Krushelnick, E.L. Clark, R. Allott, F.N. Beg, C.N. Danson, et al.. Ultrahigh-intensity laser-produced plasmas as a compact heavy ion injection source. IEEE Transactions on Plasma Science, 2000, 28 (4), pp.1110. ⟨10.1109/27.893296⟩. ⟨hal-01165306⟩