Low damage cryoetching of low-K materials

Remi Dussart (1) , Thomas Tillocher (1) , Floriane Leroy (1) , Philippe Lefaucheux (1) , Koichi Yatsuda (2) , Kaoru Maekawa (2) , Eichi Nishimura (2) , Liping Zhang (3) , Jean-Francois de Marneffe (3) , Mikhail Baklanov (3)

1 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
2 TEL - Tokyo Electron
3 IMEC - IMEC

Domaines: Physique des plasmas [physics.plasm-ph]

Remi Dussart, Thomas Tillocher, Floriane Leroy, Philippe Lefaucheux, Koichi Yatsuda, et al.. Low damage cryoetching of low-K materials . SPIE Advanced Lithography 2015, Feb 2015, San José, United States. ⟨hal-01151543⟩