A novel low temperature etch approach to reduce ULK plasma damage

Liping Zhang (1) , Jean-Francois de Marneffe (1) , Floriane Leroy (2) , Rami Ljazouli (2) , Philippe Lefaucheux (2) , Thomas Tillocher (2) , Remi Dussart (2) , Kaoru Maekawa (3) , Koichi Yatsuda (3) , Christian Dussarat (4) , Stefan de Gendt (5, 1) , Mikhail Baklanov (1)

1 IMEC - IMEC
2 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
3 TEL - Tokyo Electron
4 Air Liquide [Siège Social]
5 KU Leuven - Catholic University of Leuven = Katholieke Universiteit Leuven

Domaines: Physique des plasmas [physics.plasm-ph]

Liping Zhang, Jean-Francois de Marneffe, Floriane Leroy, Rami Ljazouli, Philippe Lefaucheux, et al.. A novel low temperature etch approach to reduce ULK plasma damage. Plasma Etch and Strip in Microtecnology, Apr 2015, Leuven, Belgium. ⟨hal-01151524⟩