Comparison of Thermodynamic Databases for the Modeling of SiC Growth by PVT
Résumé
The numerical modeling of the SiC bulk growth process by physical vapor transport has been established as the essential tool for the process development. An accurate computation of mass transfers is strongly dependent on the equilibrium partial pressure calculations. In this paper, we compare the relative impact of the different thermodynamic databases available on the full PVT process modeling. We found that whatever the database used, the trends regarding growth rate calculation, crystal shape, Si/C ratio are correctly described and none of the database would bring about unacceptable errors from the process development point of view even if some discrepancies in the absolute values could be obtained.