CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns

G. Gay , T. Baron (1) , C. Agraffeil , B. Salhi (1) , T. Chevolleau (1) , G. Cunge (1) , H. Grampeix , J.H. Tortai (1) , F. Martin , E. Jalaguier , B. de Salvo

1 LTM - Laboratoire des technologies de la microélectronique

G. Gay, T. Baron, C. Agraffeil, B. Salhi, T. Chevolleau, et al.. CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns. Nanotechnology, 2010, 43, pp.435301. ⟨10.1088/0957-4484/21/43/435301⟩. ⟨hal-00944905⟩