Advances in the deposition of microcrystalline silicon at high rate by distributed electron cyclotron resonance

P. Roca I Cabarrocas (1) , Pavel Bulkin (1) , D. Daineka (1) , T. H. Dao (1) , P. Leempoel (2) , P. Descamps (2) , T. Kervyn de Meerendré (2) , J. Charliac

1 LPICM - Laboratoire de physique des interfaces et des couches minces [Palaiseau]
2 Dow Corning ATVB Energy

Domaines: Sciences de l'ingénieur [physics]

P. Roca I Cabarrocas, Pavel Bulkin, D. Daineka, T. H. Dao, P. Leempoel, et al.. Advances in the deposition of microcrystalline silicon at high rate by distributed electron cyclotron resonance. Thin Solid Films, 2008, pp.6834-6838. ⟨hal-00915445⟩