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Article Dans Une Revue Journal of Physics D: Applied Physics Année : 2012

Structured epitaxial graphene: growth and properties

Résumé

Graphene is generally considered to be a strong candidate to succeed silicon as an electronic material. However, to date, it actually has not yet demonstrated capabilities that exceed standard semiconducting materials. Currently demonstrated viable graphene devices are essentially limited to micron size ultrahigh frequency analog field effect transistors and quantum Hall effect devices for metrology. Nanoscopically patterned graphene tends to have disordered edges which severely reduce mobilities thereby obviating its advantage over other materials. Here we show that graphene grown on structured silicon carbide surfaces overcomes the edge roughness and promises to provide an inroad into nanoscale patterning of graphene. We show that high quality ribbons and rings can be made using this technique. We also report on progress towards high mobility graphene monolayers on silicon carbide for device applications.
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Dates et versions

hal-00911809 , version 1 (30-11-2013)

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Yike Hu, Ming Ruan, Zelei Guo, Rui Dong, James Palmer, et al.. Structured epitaxial graphene: growth and properties. Journal of Physics D: Applied Physics, 2012, 45 (15), pp.154010. ⟨10.1088/0022-3727/45/15/154010⟩. ⟨hal-00911809⟩

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