Polarity control of intrinsic ZnO films using substrate bias

J.R. Williams (1, 2) , H. Furukawa (3, 4) , Y. Adachi (2, 3) , S.Y. Grachev (2, 5) , E. Sondergard (2, 5) , N. Ohashi (2, 3, 4)

1 International Center for Materials Nanoarchitectonics
2 NIMS Saint-Gobain Research Center of Excellence for Advanced Materials
3 Optical and Electronic Materials Unit
4 Department of Applied Science for Electronics and Materials
5 SVI - Surface du Verre et Interfaces

The structures and properties of zinc oxide thin films deposited by radio-frequency magnetron sputtering were investigated for different substrate biases applied during deposition. The electrical bias determined the crystalline polarity of a nominally undoped film on an amorphous substrate: films with a (0001) surface and a (000 1) surface were produced under positive and negative biases, respectively. Moreover, the polarity of the films was determined at an early stage of the deposition and could not be reversed by switching the substrate bias.

Domaines: Science des matériaux [cond-mat.mtrl-sci]

J.R. Williams, H. Furukawa, Y. Adachi, S.Y. Grachev, E. Sondergard, et al.. Polarity control of intrinsic ZnO films using substrate bias. Applied Physics Letters, 2013, 103, pp.042107. ⟨10.1063/1.4816509⟩. ⟨hal-00851034⟩