Low Damage Cryogenic Etching of Porous Organosilicate Low-k Materials Using SF6/O2/SiF4

Liping Zhang (1) , Rami Ljazouli , Philippe Lefaucheux (2) , Thomas Tillocher (2) , Remi Dussart (2) , Yuri Mankelevich (1) , Jean-Francois de Marneffe (1) , Stefan de Gendt (1) , Mikhail Baklanov (1)

1 IMEC - IMEC
2 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés

Domaines: Physique des plasmas [physics.plasm-ph]

Liping Zhang, Rami Ljazouli, Philippe Lefaucheux, Thomas Tillocher, Remi Dussart, et al.. Low Damage Cryogenic Etching of Porous Organosilicate Low-k Materials Using SF6/O2/SiF4. ECS Journal of Solid State Science and Technology, 2013, 2 (6), pp.N131. ⟨10.1149/2.001306jss⟩. ⟨hal-00831339⟩