Characterizations of CrN/a-CNx nanolayered coatings deposited by DC reactive magnetron sputtering of Cr and graphite targets - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Vacuum Année : 2011

Characterizations of CrN/a-CNx nanolayered coatings deposited by DC reactive magnetron sputtering of Cr and graphite targets

Pascal Briois
D. Mercs
  • Fonction : Auteur
Oksana Banakh
  • Fonction : Auteur
Frédéric Sanchette
Alain Billard

Résumé

CrN/a-CNx nanolayered coatings have been deposited by DC reactive magnetron sputtering of pure Cr and graphite targets. The total thickness is 1 μm and that of a-CNx layers is kept constant at 3.5 nm. The period (bilayer thickness) is in the range 8-16 nm. CrN and a-CNx layers are crystalline and amorphous respectively. The decrease of CrN layers' thickness (decrease of period) in the stack leads to refinement of CrN microstructure associated with (200) preferred orientation. The hardness of nanolayered films is independent of the period's thickness, while internal compressive stress, which remains between that of each elementary layer, follows an evolution close to that of the law of mixtures. The best tribological behaviours are reached for a periods' thickness of 8 nm.

Domaines

Matériaux

Dates et versions

hal-00824391 , version 1 (21-05-2013)

Identifiants

Citer

Pascal Briois, D. Mercs, Valérie Demange, Oksana Banakh, Frédéric Sanchette, et al.. Characterizations of CrN/a-CNx nanolayered coatings deposited by DC reactive magnetron sputtering of Cr and graphite targets. Vacuum, 2011, 86 (2), pp.206-209. ⟨10.1016/j.vacuum.2011.06.008⟩. ⟨hal-00824391⟩
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