Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy

L. Azarnouche (1) , E. Pargon (1) , K. Menguelti (1) , M. Fouchier (1) , D. Fuard (1) , P. Gouraud (2) , C. Verove (2) , O. Joubert (1)

1 LTM - Laboratoire des technologies de la microélectronique
2 ST-CROLLES - STMicroelectronics [Crolles]

L. Azarnouche, E. Pargon, K. Menguelti, M. Fouchier, D. Fuard, et al.. Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy. Journal of Applied Physics, 2012, pp.111, 084318. ⟨10.1063/1.4705509⟩. ⟨hal-00808841⟩