Study of the lateral growth by VLS mechanism using Al-based melts on patterned SiC substrate

Jean Lorenzzi (1) , Romain Esteve (2) , Mihai Lazar (3) , Dominique Tournier (3) , Davy Carole (1) , Gabriel Ferro (1)

1 LMI - Laboratoire des Multimatériaux et Interfaces
2 Acreo AB
3 AMPERE - Ampère

In this work we report on SiC epitaxial growth by vapour-liquid-solid (VLS) mechanism on on-axis 4H-SiC(0001) substrates which were previously patterned to form mesa structures. The liquid phase was set to Al 70Si 30. At 1100°C, it led to very high homoepitaxial lateral growth (140 μm/h) with pronounced spiral growth and in plane anisotropy of growth rate. Upon temperature increase to 1200 °C, this spiral growth was suppressed and the lateral growth was further increased up to 180 μm/h. The in-plane versus out-of-plane anisotropy of growth rate was found to be as high as 60 at this temperature and 46 at 1100°C.

Mots clés: Lateral enlargement; Homoepitaxy; Aluminum; P-type doping; Patterned substrate; VLS growth; Patterned substrates

Domaines: Energie électrique

Jean Lorenzzi, Romain Esteve, Mihai Lazar, Dominique Tournier, Davy Carole, et al.. Study of the lateral growth by VLS mechanism using Al-based melts on patterned SiC substrate. CSCRM, Sep 2011, Cleveland, United States. ⟨hal-00747299⟩