Deposition of high k Y2O3 oxides by pulsed injection plasma enhanced MOCVD

Corentin Vallée (1) , C. Durand (1) , B. Pelissier (1) , M. Bonvalot (1) , E. Gautier , C. Dubourdieu (2) , L. Vallier (1) , O. Joubert (1)

1 LTM - Laboratoire des technologies de la microélectronique
2 LMGP - Laboratoire des matériaux et du génie physique

Corentin Vallée, C. Durand, B. Pelissier, M. Bonvalot, E. Gautier, et al.. Deposition of high k Y2O3 oxides by pulsed injection plasma enhanced MOCVD. 12th Workshop on Dielectrics in Microelectronics (WODIM), Nov 2002, Grenoble, France. ⟨hal-00669570⟩