Impact of Synchronized Plasma Pulsing Technologies on Key Parameters Governing STI Etch Processes

M. Haass (1) , Maxime Darnon (1) , G. Cunge (1) , P. Bodart (1) , C. Petit-Etienne (1) , M. Brihoum (1) , L. Vallier (1) , S. Banna , O. Joubert (1)

1 LTM - Laboratoire des technologies de la microélectronique

M. Haass, Maxime Darnon, G. Cunge, P. Bodart, C. Petit-Etienne, et al.. Impact of Synchronized Plasma Pulsing Technologies on Key Parameters Governing STI Etch Processes. AVS 58h international symposium, Oct 2011, Nashville, United States. ⟨hal-00647636⟩