Phase-mask grating printing to extremes

Yannick Bourgin (1) , Yves Jourlin (1) , Svetlen Tonchev (1, 2) , Ismo Vartiainen (3) , Markku Kuittinen (3) , Anne Talneau (4) , Olivier Parriaux (1)

1 LHC - Laboratoire Hubert Curien
2 ISSP - Institut of the Solid State Physics
3 department of physics and mathematics- campus of Joensuu
4 LPN - Laboratoire de photonique et de nanostructures

The very restricted range of grating periods printable by standard silica phase-masks is here extended from close to the 45 nm CD-node to arbitrarily large periods by the appropriate choice of material and interference-generating scheme with a potential for unlimited length and wide area.

Domaines: Optique / photonique

Yannick Bourgin, Yves Jourlin, Svetlen Tonchev, Ismo Vartiainen, Markku Kuittinen, et al.. Phase-mask grating printing to extremes. EOS Annual Meeting 2010, Oct 2010, Paris, France. pp.3637. ⟨hal-00537951⟩