Skip to Main content Skip to Navigation
Journal articles

High aspect ratio nanochannel machining using single shot femtosecond Bessel beams

Abstract : We report high aspect ratio nanochannel fabrication in glass using single-shot femtosecond Bessel beams of sub-3 μJ pulse energies at 800 nm. We obtain near-parallel nanochannels with diameters in the range 200–800 nm, and aspect ratios that can exceed 100. An array of 230 nm diameter channels with 1.6 μm pitch illustrates the reproducibility of this approach and the potential for writing periodic structures. We also report proof-of-principle machining of a through-channel of 400 nm diameter in a 43 μm thick membrane. These results represent a significant advance of femtosecond laser ablation technology into the nanometric regime.
Document type :
Journal articles
Complete list of metadatas

https://hal.archives-ouvertes.fr/hal-00517173
Contributor : Sarah Djaouti <>
Submitted on : Monday, September 13, 2010 - 4:55:03 PM
Last modification on : Monday, December 21, 2020 - 12:02:08 PM

Identifiers

Citation

M.K. Bhuyan, F. Courvoisier, P.-A. Lacourt, M. Jacquot, R. Salut, et al.. High aspect ratio nanochannel machining using single shot femtosecond Bessel beams. Applied Physics Letters, American Institute of Physics, 2010, 97, pp.081102. ⟨10.1063/1.3479419⟩. ⟨hal-00517173⟩

Share

Metrics

Record views

193