Diffuse-interface model for nanopatterning induced by self-sustained ion-etch masking

Sébastien Le Roy (1) , Elin Sondergard (1) , Ingar S. Nerbo (2) , Morten Kildemo (3) , Mathis Plapp (4)

1 SVI - Surface du Verre et Interfaces
2 Physics Department, Norwegian University of Science and Technology
3 Physics Department, Nowegian University of Science and Technology
4 LPMC - Laboratoire de physique de la matière condensée

We construct a simple phenomenological diffuse-interface model for composition-induced nanopatterning during ion sputtering of alloys. In simulations, this model reproduces without difficulties the high-aspect-ratio structures and tilted pillars observed in experiments. We investigate the time evolution of the pillar height, both by simulations and by in situ ellipsometry. The analysis of the simulation results yields a good understanding of the transitions between different growth regimes and supports the role of segregation in the pattern-formation process.

Domaines: Science des matériaux [cond-mat.mtrl-sci]

Sébastien Le Roy, Elin Sondergard, Ingar S. Nerbo, Morten Kildemo, Mathis Plapp. Diffuse-interface model for nanopatterning induced by self-sustained ion-etch masking. Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2010, 81 (16), pp.161401. ⟨hal-00499414⟩