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Rigorous electromagnetic simulation of EUV masks: influence of the absorber properties

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https://hal.archives-ouvertes.fr/hal-00490483
Contributor : Marielle Clot Connect in order to contact the contributor
Submitted on : Tuesday, June 8, 2010 - 5:21:58 PM
Last modification on : Wednesday, October 20, 2021 - 3:33:12 AM

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  • HAL Id : hal-00490483, version 1

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P. Schiavone, G. Granet, J.Y Robic. Rigorous electromagnetic simulation of EUV masks: influence of the absorber properties. Microelectronic Engineering, Elsevier, 2001, pp.vol. 57-58, 497. ⟨hal-00490483⟩

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