The effects of HCl on silicon nanowire growth: surface chlorination and existence of a 'diffusion-limited minimum diameter

F. Oehler (1) , P. Gentile (1) , T. Baron (2) , P. Ferret (3)

1 SiNaps - Silicon Nanoelectronics Photonics and Structures
2 LTM - Laboratoire des technologies de la microélectronique
3 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information

Domaines: Matière Condensée [cond-mat]; Science des matériaux [cond-mat.mtrl-sci]

F. Oehler, P. Gentile, T. Baron, P. Ferret. The effects of HCl on silicon nanowire growth: surface chlorination and existence of a 'diffusion-limited minimum diameter. Nanotechnology, 2009, pp.20 (47): Art. No. 475307 NOV 25 2009. ⟨hal-00455409⟩