Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm Photoresists

E. Pargon (1) , K. Menguelti (1) , M. Martin , A. Bazin , O. Chaix-Pluchery (2) , O. Sourd , S. Derrough , T. Lill , O. R. Joubert (1)

1 LTM - Laboratoire des technologies de la microélectronique
2 LMGP - Laboratoire des matériaux et du génie physique

E. Pargon, K. Menguelti, M. Martin, A. Bazin, O. Chaix-Pluchery, et al.. Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm Photoresists. Journal of Applied Physics, 2009, pp.094902. ⟨hal-00454171⟩