ZrOxNy decorative thin films prepared by the reactive gas pulsing process

P. Carvalho; L. Cunha; E. Alves; Nicolas Martin; Eric Le Bourhis; F. Vaz

doi:10.1088/0022-3727/42/19/195501

Journal Articles Journal of Physics D: Applied Physics Year : 2009

ZrOxNy decorative thin films prepared by the reactive gas pulsing process

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P. Carvalho

Function : Author

L. Cunha

Function : Author

E. Alves

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Nicolas Martin

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PersonId : 847925

Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174)

Eric Le Bourhis

Function : Author
PersonId : 1078770

Laboratoire de Physique des Matériaux

F. Vaz

Function : Author

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Nicolas Martin : Connect in order to contact the contributor

https://hal.science/hal-00437753

Submitted on : Tuesday, December 1, 2009-1:53:00 PM

Last modification on : Wednesday, January 31, 2024-5:30:09 PM

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hal-00437753 , version 1 (01-12-2009)

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HAL Id : hal-00437753 , version 1
DOI : 10.1088/0022-3727/42/19/195501

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P. Carvalho, L. Cunha, E. Alves, Nicolas Martin, Eric Le Bourhis, et al.. ZrOxNy decorative thin films prepared by the reactive gas pulsing process. Journal of Physics D: Applied Physics, 2009, 42, pp.195501-7. ⟨10.1088/0022-3727/42/19/195501⟩. ⟨hal-00437753⟩

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ZrOxNy decorative thin films prepared by the reactive gas pulsing process

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