Radiative heat transfer at nanoscale mediated by surface plasmons for highly doped silicon.

Emmanuel Rousseau (1) , Marine Laroche (1) , Jean-Jacques Greffet (1)

1 Laboratoire Charles Fabry de l'Institut d'Optique / Naphel

In this letter, we revisit the role of surface plasmons for nanoscale radiative heat transfer between doped silicon surfaces. We derive a new accurate and closed-form expression of the radiative near-field heat transfer. We also analyse the flux and find that there is a doping level that maximizes the heat flux.

Domaines: Thermique [physics.class-ph]; Thermique [physics.class-ph]; Optique [physics.optics]; Micro et nanotechnologies/Microélectronique

Emmanuel Rousseau, Marine Laroche, Jean-Jacques Greffet. Radiative heat transfer at nanoscale mediated by surface plasmons for highly doped silicon.. Applied Physics Letters, 2009, 95, pp.231913. ⟨10.1063/1.3271681⟩. ⟨hal-00428587⟩