193 nm photolithographic properties of chemically amplified photoresists with well-defined molecular structures

Hassam Ridaoui (1) , Ali Dirani (1) , Olivier Soppera (1) , I. Ismailova (1) , Cyril Brochon (2) , G. Schlatter , C. Serra , Georges Hadziioanou (2) , Ralouca Tiron (3) , P. Bandelier , Claire Sourd (3)

1 Departement de Photochimie Générale
2 Laboratoire d'Ingenierie des Polymères pour les Hautes Technologies
3 Lithography Laboratory

Domaines: Matériaux; Polymères

Hassam Ridaoui, Ali Dirani, Olivier Soppera, I. Ismailova, Cyril Brochon, et al.. 193 nm photolithographic properties of chemically amplified photoresists with well-defined molecular structures. 26th InternationalConference of Photopolymer Science and Technology, Jun 2009, CHIBA, Japan. ⟨hal-00411887⟩