Study of mechanisms involved in photoresist microlens formation

Stéphanie Audran (1, 2) , Jean-Baptiste Faure (1) , J. Regolini (1) , Guy Schlatter (2) , Georges Hadziioannou (2, 3)

1 ST-CROLLES - STMicroelectronics [Crolles]
2 Laboratoire d'Ingenierie des Polymères pour les Hautes Technologies
3 Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies

The mechanisms involved in photoresist microlens formation are investigated in order to understand the lack of sphericity of certain experimental microlenses. A characterization of the resist rheological properties has enabled to demonstrate that there is a competition between surface tensions and resist crosslinking reaction during the final process bake. Depending on the process conditions, the crosslinking reaction kinetics dominate and prevent the correct formation of the microlens.

Mots clés: microlens; reflow method; crosslinking; rheological properties

Domaines: Polymères

Stéphanie Audran, Jean-Baptiste Faure, J. Regolini, Guy Schlatter, Georges Hadziioannou. Study of mechanisms involved in photoresist microlens formation. Microelectronic Engineering, 2006, 83 (4-9), pp.1087-1090. ⟨10.1016/j.mee.2006.01.150⟩. ⟨hal-00402979⟩