The synthesis and formulation of photosensitive resins towards: low line edge roughness of high resolution photolithography patterns

Esma Ismailova (1) , Christos L. Chochos (2) , Cyril Brochon (1) , Nicolas Leclerc (1) , Christophe A. Serra (1) , Georges Hadziioannou (1) , Ralouca Tiron (3) , Claire Sourd (3) , Johann Foucher (3) , Philippe Bandelier (3) , Damien Perret (4) , Christophe Brault (4) , Hassam Ridaoui (5) , Olivier Soppera (5)

1 Laboratoire d'Ingenierie des Polymères pour les Hautes Technologies
2 IPC - Institute of Physical Chemistry "Demokritos"
3 Lithography Laboratory
4 Rohm et Haas Electronic Materials
5 DPG - Département de Photochimie Générale

Domaines: Matériaux; Polymères

Esma Ismailova, Christos L. Chochos, Cyril Brochon, Nicolas Leclerc, Christophe A. Serra, et al.. The synthesis and formulation of photosensitive resins towards: low line edge roughness of high resolution photolithography patterns. MNE 2008, Sep 2008, Athenes, Greece. ⟨hal-00324377⟩