Temperature Measurement of Microsystems by Scanning Thermal Microscopy

S. Gomès (1) , O. Chapuis (2) , F. Nepveu (1) , N. Trannoy (2) , S. Volz (2) , B. Charlot (2) , G. Tessier (2) , S. Dilhaire (2) , B. Cretin (2) , P. Vairac (2)

1 Génome, Population, Interactions
2 MN - Micro et nanothermique

Surface temperature measurements were performed with a Scanning Thermal Microscope. We aim at proving an eventual sub-micrometric resolution of this metrology when using a wollaston wire probe of micrometric size. A dedicated CMOS device was designed with arrays of lines 0.35mm in size with 0.8 mm and 10mm periods. Integrated Circuits with or without a passivition layer were tested. To enhance sensitivity, the IC heat source was excited with an AC current. We show that the passivation layer spreads heat so that the lines are not distinguishable. Removing this layer allows us to distinguish the lines in the case of the 10mm period.

Mots clés: Scanning Thermal Microscopy Temperature measurement Thermal analysis techniques Thermal-resistive probe

Domaines: Architectures Matérielles [cs.AR]

S. Gomès, O. Chapuis, F. Nepveu, N. Trannoy, S. Volz, et al.. Temperature Measurement of Microsystems by Scanning Thermal Microscopy. THERMINIC 2005, Sep 2005, Belgirate, Lago Maggiore, Italy. pp.300-303. ⟨hal-00189490⟩