Diffusion and activation of dopants in silicon and advanced silicon-based materials

P. Pichler , C.J. Ortiz , B. Colombeau , N.E.B. Cowern , E. Lampin (1) , S. Uppal , M.S.A. Karunaratne , J.M. Bonar , A. Willoughby , Alain Claverie , Fuccio Cristiano , W. Lerch , S. Paul

1 IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520

P. Pichler, C.J. Ortiz, B. Colombeau, N.E.B. Cowern, E. Lampin, et al.. Diffusion and activation of dopants in silicon and advanced silicon-based materials. Physica Scripta, 2006, T126, pp.89-96. ⟨hal-00138673⟩