Liquid nitrogen to room temperature thermometry using niobium nitride thin films
Résumé
Niobium nitride thin film thermometry has been developed for the temperature range of 70K to 300K. The deposition parameters have been optimized in order to get the best performances, i.e. the highest temperature coefficient of resistance (TCR), up to 300K. The TCR is found to be largely higher than 1% as the temperature is lowered from 300K, up to 6% at 77K. These significant performances are compared to the one of regular platinum thermometer as well as to other resistive thermometer: semiconductor type or amorphous metal to insulator transition materials. It is discussed how the properties of the NbN thin films could be due to a high temperature Mott transition.
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