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Communication Dans Un Congrès Année : 2006

ZnTe precipitates formed in SiO2 by sequential implantation of Zn+ and Te+ ions

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Dates et versions

hal-00128492 , version 1 (01-02-2007)

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  • HAL Id : hal-00128492 , version 1

Citer

R. Chemam, J.J. Grob, A. Bouabellou, D. Muller. ZnTe precipitates formed in SiO2 by sequential implantation of Zn+ and Te+ ions. Apr 2006, pp.215-219 vol.113 - Ussues 3-4. ⟨hal-00128492⟩

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