Influence of the substrate/photo-active solution interaction in patterning and adhesion of photo-deposited films

Emmanuel Hugonnot (1) , Marie-Hélène Delville (2) , Jean-Pierre Delville (1)

1 CPMOH - Centre de physique moléculaire optique et hertzienne
2 ICMCB - Institut de Chimie de la Matière Condensée de Bordeaux

Using the photo-chemical deposition of chromium hydroxide layers driven by a continuous Ar+ laser wave in a potassium chromate solution, we explored the adhesion and patterning properties of the induced deposit on glass substrates versus the composition and the pH of the photo-active solution. The experiments were performed with two interfering beams imprinting an optical pattern on the substrate and analyzing the resulting morphology of the deposit. The solubility, patterning and adhesion are investigated using both organic (acetic acid) and inorganic (HCl) acids. The observed adhesion as a function of the pH in the photo-deposition process (surface versus bulk) was compared for several substrates.

Mots clés: Photo-chemical deposition; Surface patterning; Adhesion; Laser; Chromate

Domaines: Matériaux

Emmanuel Hugonnot, Marie-Hélène Delville, Jean-Pierre Delville. Influence of the substrate/photo-active solution interaction in patterning and adhesion of photo-deposited films. Applied Surface Science, 2005, vol. 248 (1-4), pp.479-483. ⟨10.1016/j.apsusc.2005.03.068⟩. ⟨hal-00095271⟩