Fluorination of nanosized amorphous silica derived from silicate raw materials - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Fluorine Notes Journal Année : 2012

Fluorination of nanosized amorphous silica derived from silicate raw materials

Résumé

Surface properties of nanosized silica, synthesized using fluoridation technologies, have been modified by direct fluorination using F2-gas or by plasma radio frequency. The modifications of the physicochemical characteristics of the surface have been characterized by spectrometry of photoelectrons (XPS), infrared and high resolution transmission electronic microscopy and compared with those of pristine silica.

Domaines

Matériaux
Fichier principal
Vignette du fichier
Tressaud_FluorineNotesJ_2012.pdf (1.01 Mo) Télécharger le fichier
Origine : Fichiers éditeurs autorisés sur une archive ouverte

Dates et versions

hal-00727622 , version 1 (29-11-2023)

Identifiants

  • HAL Id : hal-00727622 , version 1

Citer

Larisa P. Demyanova, Alain Tressaud, Christine Labrugère, Etienne Durand, Jérôme Majimel, et al.. Fluorination of nanosized amorphous silica derived from silicate raw materials. Fluorine Notes Journal, 2012, 3 (82), 6 p. ⟨hal-00727622⟩
61 Consultations
4 Téléchargements

Partager

Gmail Facebook X LinkedIn More