Supercritical fluid chemical deposition as an alternative process to CVD for the surface modification of materials - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Chemical Vapor Deposition Année : 2011

Supercritical fluid chemical deposition as an alternative process to CVD for the surface modification of materials

Résumé

Taking the desirable attributes of CVD and aqueous plating techniques while minimizing the disadvantages of each, supercritical fluid chemical deposition (SFCD) demonstrates itself to be a promising process alternative to enable the fabrication of nanostructured devices. This paper gives information about the SFCD process for metal deposition as an alternative to CVD through various examples of inorganic deposition (films or nanostructures). In particular, the use of SFCD will be demonstrated for the surface modification of carbon nanotubes (CNTs) and their decoration with palladium nanoparticles.

Domaines

Matériaux

Dates et versions

hal-00653329 , version 1 (19-12-2011)

Identifiants

Citer

Mélanie Majimel, Samuel Marre, Elsa Garrido, Cyril Aymonier. Supercritical fluid chemical deposition as an alternative process to CVD for the surface modification of materials. Chemical Vapor Deposition, 2011, 17 (10-12), pp.342-352. ⟨10.1002/cvde.201106921⟩. ⟨hal-00653329⟩
80 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More