Surface modification of phyllosilicate minerals by fluorination methods

Alain Tressaud (1) , Christine Labrugère (1) , Etienne Durand (1) , Hélène Serier (1) , Larisa P. Demyanova (2)

1 ICMCB - Institut de Chimie de la Matière Condensée de Bordeaux
2 Institute of Geology and Nature Management

The effect of fluorination on various types of phyllosilicate minerals has been investigated. Two different fluorination techniques have been used: direct F₂ gas and cold radio frequency plasma involving c-C₄F₈ or O₂/CF₄ mixtures. The modifications of the surface composition and properties have been followed mostly by x-ray photoelectron spectroscopy (XPS). Depending of the fluorination reagents, a reactive etching process involving M-F bonding occurs (direct F₂ gas; O₂–CF₄ rf plasma) or a carbon fluoride deposition takes place (c-C₄F₈ rf plasma). In the case of F₂-gas treated minerals, Si 2p XPS signal accounts for the presence of fluorinated Si environments.

Domaines: Matériaux

Alain Tressaud, Christine Labrugère, Etienne Durand, Hélène Serier, Larisa P. Demyanova. Surface modification of phyllosilicate minerals by fluorination methods. Journal of Vacuum Science & Technology A, 2010, 28 (2), pp.373-381. ⟨10.1116/1.3328826⟩. ⟨hal-00470646⟩