ZnO homoepitaxy on the O polar face of hydrothermal and melt-growth substrates by pulsed laser deposition

David Rogers (1, 2) , F. Hosseini Teherani (1) , Alain Largeteau (3) , Gérard Demazeau (3) , C. Moisson (4) , D. Turover (4) , J. Nause (5) , G. Garry (6) , R. Kling (7) , T. Gruber (7) , A. Waag (8) , F. Jomard (9) , P. Galtier (9) , A. Lusson (9) , T. Monteiro (10) , M. J. Soares (10) , A. Neves (10) , M. C. Carmo (10) , M. Peres (10) , Gilles Lerondel (2) , Christophe Hubert (2)

1 Nanovation SARL
2 LNIO - Laboratoire de Nanotechnologie et d'Instrumentation Optique
3 ICMCB - Institut de Chimie de la Matière Condensée de Bordeaux
4 NOVASiC
5 Cermet Inc.
6 Thales Research
7 Department of Semiconductor Physics
8 Institute of Semiconductor Technology
9 LPSC - Laboratoire de physique des solides et de cristallogénèse
10 Physics Department

2 cm diameter hydrothermal ZnO crystals were grown and then made into substrates using both mechanical and chemical-mechanical polishing (CMP). CMP polishing showed superior results with an (0002) Ω scan full width half maximum (FWHM) of 67 arcsec and an root mean square (RMS) roughness of 2 Å. In comparison, commercial melt-grown substrates exhibited broader X-ray diffraction (XRD) linewidths with evidence of sub-surface crystal damage due to polishing, including a downward shift of c-lattice parameter...

Mots clés: Chemical Mechanical Polishing; Full Width Half Maximum; Hydrothermal crystal growth; Glow Discharge Mass Spectroscopy; Root Mean Square Roughness; Polar Face

Domaines: Matériaux

David Rogers, F. Hosseini Teherani, Alain Largeteau, Gérard Demazeau, C. Moisson, et al.. ZnO homoepitaxy on the O polar face of hydrothermal and melt-growth substrates by pulsed laser deposition. Applied physics. A, Materials science & processing, 2007, 88 (1), pp.49-56. ⟨10.1007/s00339-007-3975-z⟩. ⟨hal-00155069⟩