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Article Dans Une Revue Journal de Physique IV Proceedings Année : 2005

Preparation and characterization of the silicon clathrate NaxSi136 (x -> 0)

Résumé

The type-II silicon clathrate, Na$_{\rm x}$Si136, having a residual sodium content as low as 37 ppm (x = 0.0062) has been prepared by thermal decomposition of NaSi under high vacuum in the temperature range 340-420 $^{\circ}$C followed by subsequent treatments under high vacuum, and completed by several treaments with iodine at 300-350 $^{\circ}$C. The final sample was characterized by XRD, chemical analysis and EPR spectroscopy. This latter technique proved to be particularly suitable to the characterization of highly diluted sodium atoms in the open host lattice of a type II clathrate of silicon and the quantitaive determination of the residual sodium content.

Domaines

Matériaux

Dates et versions

hal-00083725 , version 1 (03-07-2006)

Identifiants

Citer

Abdelaziz Ammar, Christian Cros, Michel Pouchard, Nicolas Jaussaud, Jean-Marc. Bassat, et al.. Preparation and characterization of the silicon clathrate NaxSi136 (x -> 0). Journal de Physique IV Proceedings, 2005, vol. 123, p. 29-34. ⟨10.1051/jp4:2005123004⟩. ⟨hal-00083725⟩
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