A global model for the inductively coupled rf discharges in Ar/H2 mixture

Hocine Tebani (1) , Djilali Benyoucef (1)

1 UHBC - Université Hassiba Ben Bouali de Chlef

This paper presents the simulation of the rf Inductively Coupled Plasma (ICP) characteristics in the Ar/H2 mixture at low pressure, within a cylindrical stainless steel chamber. The global model used in this study and implemented on the COMSOL Multiphysics software, is elaborated under four main components: The fluid model for plasma species is associated with the lectromagnetic equations for the calculation of the electric field using the magnetic vector potential. Moreover, since the plasma is weakly ionized, the properties of the neutral gas species must be taken into account by using the Navier-Stokes equation to describe the gas flow and the heat transfer equation to calculate the gas heating due to elastic collisions between electrons and neutrals. In this work, the model is first applied in order to understand the physical and chemical processes in the Ar/H2 plasmas. The properties of plasma species in the mixture are second investigated as a function of hydrogen fraction assuming the Maxwellian electron energy distribution. The theoretical interpretations of the obtained results are also addressed in this paper.

Mots clés: : inductively coupled plasma; hydrogen; Argon; gas temperature; gas follow; magnetic potential; fluid model

Domaines: Physique [physics]; Sciences de l'ingénieur [physics]; Plasmas

Hocine Tebani, Djilali Benyoucef. A global model for the inductively coupled rf discharges in Ar/H2 mixture. Przeglad Elektrotechniczny , 2021, 1 (1), pp.32-38. ⟨10.15199/48.2021.01.06⟩. ⟨hal-03995576⟩