Properties of µPCVD poly-silicon films after rapid thermal annealing

G. Beshkov , D. Dimitrov , K. Gesheva , V. Bakardjieva

Polly-Silicon Films obtained by µPCVD were studied with respect to their structural and electrical properties influenced by rapid thermal annealing (RTA) in vacuum. In addition an annealing in H2 atmosphere at atmospheric pressure was curried out. The structure and the morphology of the films were studied by Reflection High Energy Electron Diffraction (RHEED) technique and Scanning Electron Microscopy (SEM), respectively. An effect of increase of the crystallinity of the poly-Si films was observed as a result of RTA annealing. These observations coincide well with the measured sheet resistance of the layers. It was found that sheet resistance of the as-deposited films is about [MATH] and it decreases to a value of about [MATH] in dependence on the annealing.

Domaines: Articles anciens

G. Beshkov, D. Dimitrov, K. Gesheva, V. Bakardjieva. Properties of µPCVD poly-silicon films after rapid thermal annealing. Journal de Physique IV Proceedings, 1993, 03 (C3), pp.C3-493-C3-497. ⟨10.1051/jp4:1993368⟩. ⟨jpa-00251425⟩