HIGH TEMPERATURE STRESS MEASUREMENTS IN CVD DIAMOND FILMS

C. Johnston , A. Crossley , A. Jones , P. Chalker , F. Cullen , I. Buckley-Golder

Low pressure CVD diamond films are intended for application in the optics, biomedical, electronics and engineering industries. In a number of applications, it is important to know the growth stresses in the films at room temperature and, in addition, the stresses generated in the films as a function of temperature. The results in this paper will show the in situ measurement of stresses in CVD diamond films as a function of temperature up to 750 °C. The principal measurement techniques are Raman spectroscopic analysis and the X-ray diffraction (XRD) sin2ψ method.

Domaines: Articles anciens

C. Johnston, A. Crossley, A. Jones, P. Chalker, F. Cullen, et al.. HIGH TEMPERATURE STRESS MEASUREMENTS IN CVD DIAMOND FILMS. Journal de Physique IV Proceedings, 1991, 02 (C2), pp.C2-931-C2-937. ⟨10.1051/jp4:19912112⟩. ⟨jpa-00249791⟩