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Article Dans Une Revue Journal de Physique III Année : 1991

DX centers in AlAs and GaAs-AlAs selectively doped superlattices

S. Ababou
J. Marchand
  • Fonction : Auteur
L. Mayet
  • Fonction : Auteur
G. Guillot
F. Mollot
  • Fonction : Auteur

Résumé

DX centers have been investigated using deep level transient spectroscopy (DLTS) in Si doped AlAs and in selectively doped GaAs-AlAs superlattices (SLs) grown by molecular beam epitaxy. The activation energy for thermal emission is Ea = 0.42 eV in both the SLs and AlAs layers. For the first time a study of the capture in a SL reveals a capture activation energy Ecap = 0.36 cV, which locates the DX at Et≈60 meV below the conduction miniband. Taking into account the measured energies and trap concentrations, we show that the DX observed in the SLs lies in the AlAs layers.

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jpa-00248658 , version 1 (04-02-2008)

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S. Ababou, J. Marchand, L. Mayet, G. Guillot, F. Mollot. DX centers in AlAs and GaAs-AlAs selectively doped superlattices. Journal de Physique III, 1991, 1 (7), pp.1301-1309. ⟨10.1051/jp3:1991190⟩. ⟨jpa-00248658⟩

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