STUDY OF THE PREPARATION OF HIGH Tc SUPERCONDUCTING YBCO THIN FILMS BY A PLASMA-ASSISTED MOCVD PROCESS

Ding-Kun Peng , Guang-Yao Meng , Chun-Bao Cao , Chun-Lin Wang , Qi Fang , Yue-Huan Wu , Yu-Heng Zhang

A plasma assisted MOCVD technique was developed to prepare Y-Ba-Cu-O superconducting thin films at low temperature, typically below 400°C. The preliminary result showed that the asdeposited or in situ plasma annealed films on a number of substrates exhibited orthorhombic structure, and of approximate YBa2Cu3O7-x composition under proper operating conditions. A resistance drop of 90% at 77 K with the onset above 110 K was obtained in a film deposited on glass substrate. The deposition behaviour and the influence of deposition parameters on the deposites were also examined.

Domaines: Articles anciens

Ding-Kun Peng, Guang-Yao Meng, Chun-Bao Cao, Chun-Lin Wang, Qi Fang, et al.. STUDY OF THE PREPARATION OF HIGH Tc SUPERCONDUCTING YBCO THIN FILMS BY A PLASMA-ASSISTED MOCVD PROCESS. Journal de Physique Colloques, 1989, 50 (C5), pp.C5-149-C5-153. ⟨10.1051/jphyscol:1989521⟩. ⟨jpa-00229544⟩