Method for eliminating microorganisms present in and/or at the surface of a material to be decontaminated

Laurent Beney (1) , Philippe Cayot (2) , Cédric Grangeteau (1) , Sébastien Dupont (1)

1 PMB - Procédés Microbiologiques et Biotechnologiques
2 PCAV - Physico-Chimie de l'Aliment et du Vin

The present invention concems a method for eliminating microorganisms present in and/or at the surface of a material to be decontaminated comprising a step of irradiating said material to be decontaminated with radiation consisting of at least two light beams a1and a2 directed onto said material, the two light beams a1 and a2 respectively having a wavelength λ1 and λ2 of between 380 and 420nm.

Domaines: Biochimie, Biologie Moléculaire

Laurent Beney, Philippe Cayot, Cédric Grangeteau, Sébastien Dupont. Method for eliminating microorganisms present in and/or at the surface of a material to be decontaminated. France, Patent n° : WO 2020/020595 A1. 2020, pp.48. ⟨hal-03048342⟩