The influence of water vapor on growth stresses developed during the zircaloy-4 oxidation between 500 and 850°C - Archive ouverte HAL Accéder directement au contenu
Chapitre D'ouvrage Année : 2017

The influence of water vapor on growth stresses developed during the zircaloy-4 oxidation between 500 and 850°C

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Matériaux
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hal-01659307 , version 1 (08-12-2017)

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  • HAL Id : hal-01659307 , version 1

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Henri Buscail, Christophe Issartel, Raphaël Rolland, Françoise Rabaste, Sébastien Perrier, et al.. The influence of water vapor on growth stresses developed during the zircaloy-4 oxidation between 500 and 850°C. Advances in Chemistry Research, 40, J.C. Taylor, p. 105-139, 2017, 978-1-53612-791-1. ⟨hal-01659307⟩

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