On the structural, morphological and optical properties of ITO, ZnO, ZnO:Al and NiO thin films obtained by thermal oxidation
Résumé
Tin doped indium oxide, zinc oxide, aluminum doped zinc oxide and nickel oxides were obtained by thermal oxidation of metallic films deposited by magnetron sputtering in two substrate configurations: perpendicular and parallel to the plasma flow. The morphological, structural and optical properties of metallic and oxidized films were studied and compared. The optical characterization of oxide films revealed a very good transmittance in visible range. The morphological and structural analyses show a crystalline and compact structure for the obtained thin films. The influence of the deposition configuration on films’ roughness is clear no matter of the nature of the deposited films.