Tellurite glass thin films on silica and polymer using UV (193nm) pulsed laser ablation

Zhanxiang Zhao (1) , Gin Jose (1) , Paul Steenson (2) , Nikos Bamiedakis (3) , Richard V Penty (3) , Ian H White (3) , Animesh Jha (1)

1 University of Leeds
2 School of Electronic and Electrical Engineering [Leeds]
3 Department of Engineering [Cambridge]

Erbium doped tellurite glass thin films were deposited using excimer (193 nm) laser ablation onto two different types of substrates: silica and polymer-coated silica for engineering optical integrated active-passive devices. The deposition conditions were optimized for both substrates in order to produce high quality rare-earth (Er 3+) ion doped glass thin films with low propagation loss. The optical and spectroscopic properties of the deposited films, namely transmittance, fluorescence, lifetime as well as refractive indices at 633 nm were measured and analyzed in detail.

Mots clés: Tellurite glass; pulsed laser deposition ( PLD ); thin films; siloxane polymer; PDMS

Zhanxiang Zhao, Gin Jose, Paul Steenson, Nikos Bamiedakis, Richard V Penty, et al.. Tellurite glass thin films on silica and polymer using UV (193nm) pulsed laser ablation. Journal of Physics D: Applied Physics, 2011, 44 (9), pp.95501. ⟨10.1088/0022-3727/44/9/095501⟩. ⟨hal-00599245⟩