Templated Sub-100-nm-Thick Double-Gyroid Structure from Si-Containing Block Copolymer Thin Films

Karim Aissou (1, 2) , Muhammad Mumtaz (2, 1) , Giuseppe Portale (3) , Cyril Brochon (2, 1) , Eric Cloutet (2, 1) , Guillaume Fleury (2, 1) , Georges Hadziioannou (2, 1)

1 Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
2 LCPO - Laboratoire de Chimie des Polymères Organiques
3 Univ Groningen, Zernike Inst Adv Mat, Macromol Chem & New Polym Mat

The directed self-assembly of diblock copolymer chains (poly(1,1-dimethylsilacyclobutane)-block-polystyrene, PDMSB-b-PS) into a thin film double gyroid structure is described. A decrease of the kinetics of a typical double-wave pattern formation is reported within the 3D-nanostructure when the film thickness on mesas is lower than the gyroid unit cell. However, optimization of the solvent-vapor annealing process results in very large grains (over 10 μm²) with specific orientation (i.e., parallel to the air substrate) and direction (i.e., along the groove direction) of the characteristic (211) plane, demonstrated by templating sub-100-nm-thick PDMSB-b-PS films.

Mots clés: copolymer; directed self-assembly; double gyroid

Domaines: Polymères

Karim Aissou, Muhammad Mumtaz, Giuseppe Portale, Cyril Brochon, Eric Cloutet, et al.. Templated Sub-100-nm-Thick Double-Gyroid Structure from Si-Containing Block Copolymer Thin Films. Small, 2017, 13 (20), pp.1603777. ⟨10.1002/smll.201603777⟩. ⟨hal-01505528⟩