N-doped TiO2 coatings grown by atmospheric pressure MOCVD for visible light-induced photocatalytic activity

Florin-Daniel Duminica (1) , Francis Maury (1) , R. Hausbrand (2)

1 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux
2 ArcelorMittal Maizières Research SA

N-doped TiO2 films were deposited by atmospheric pressure CVD from titanium tetra-isopropoxide (TTIP) and N2H4 as reactive gas in the temperature range 400-500 °C on various substrates. The films grown at 400 °C are amorphous and exhibit a compact structure and a smooth surface morphology. Increasing the deposition temperature first leads to the crystallization in the anatase structure (temperature range 410-450 °C) and then to the formation of rutile, so that an anatase-rutile mixture is observed in the temperature range 450-500 °C. Correlation between the structure, the morphology, optical properties, hydrophilicity and photocatalytic activity of the thin films both under UVand VIS light are presented and discussed in relation with deposition conditions.

Mots clés: AP-MOCVD; N-doped TiO2; Supported photocatalyst; Visible photocatalysis

Domaines: Matériaux

Florin-Daniel Duminica, Francis Maury, R. Hausbrand. N-doped TiO2 coatings grown by atmospheric pressure MOCVD for visible light-induced photocatalytic activity. Surface and Coatings Technology, 2007, vol. 201, pp. 9349-9353. ⟨10.1016/j.surfcoat.2007.04.061⟩. ⟨hal-00806210⟩