Process integration of boron BSF by CVD technique on large surface in bifacial solar cell process flow

R. Cabal; N. Auriac; B. Grange; Y. Veschetti; Anne Kaminski-Cachopo; D. Heslinga

Conference Papers Year : 2010

Process integration of boron BSF by CVD technique on large surface in bifacial solar cell process flow

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1

R. Cabal

Function : Author

N. Auriac

Function : Author

B. Grange

Function : Author

Y. Veschetti

Function : Author

Anne Kaminski-Cachopo

Function : Author
PersonId : 170356
IdHAL : anne-kaminski-cachopo
ORCID : 0000-0002-9576-5844
IdRef : 09511341X

Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation

D. Heslinga

Function : Author

Domains

Micro and nanotechnologies/Microelectronics

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https://hal.science/hal-00604731

Submitted on : Wednesday, June 29, 2011-3:44:40 PM

Last modification on : Thursday, April 4, 2024-9:31:27 PM

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hal-00604731 , version 1 (29-06-2011)

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HAL Id : hal-00604731 , version 1

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R. Cabal, N. Auriac, B. Grange, Y. Veschetti, Anne Kaminski-Cachopo, et al.. Process integration of boron BSF by CVD technique on large surface in bifacial solar cell process flow. 5th World Conference on Photovoltaic Energy Conversion, Sep 2010, Valence, Spain. ⟨hal-00604731⟩

Process integration of boron BSF by CVD technique on large surface in bifacial solar cell process flow

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