Hydrophobic coatings deposited with an atmospheric pressure microplasma jet

Andreas Vogelsang (1) , Andreas Ohl (1) , Rüdiger Foest (1) , Karsten Schröder (1) , Klaus-Dieter Weltmann (1)

1 INP - Leibniz Institute for Plasma Science and Technology

Successful plasma polymerisation of a fluorocarbon compound (c-C 4 F 8) using an atmospheric pressure plasma jet is described. The source is operated with argon as working gas at a flow rate of 6 slm and 10 – 100 sccm admixtures of c-C 4 F 8. Deposition is limited to a discharge regime with strong localization and was observed for conductive substrates only (Al and Si). The deposition process is characterized by a high local growth rate (40 nm/s) and produces films which show a Teflon-like chemical structure and hydrophobicity. The coatings are characterised using X-ray photo electron spectroscopy (XPS), profilometry, and Scanning electron microscopy (SEM). Changing the ambient atmosphere from protective N 2 to normal air only reduces the deposition rate but does not change the chemistry of the film. Based on the results of parameter variations and the electrical relations of the jet-setup, the special form of the deposition regime of the jet is discussed and considered to be a γ-mode discharge dependent on the choice of substrate material.

Mots clés: micro plasma; plasma jet; thin film; deposition; fluorocarbon; XPS

Andreas Vogelsang, Andreas Ohl, Rüdiger Foest, Karsten Schröder, Klaus-Dieter Weltmann. Hydrophobic coatings deposited with an atmospheric pressure microplasma jet. Journal of Physics D: Applied Physics, 2010, 43 (48), pp.485201. ⟨10.1088/0022-3727/43/48/485201⟩. ⟨hal-00574378⟩