Modeling and kinetic Monte Carlo simulations of the metallographic etching process of second phase particles

Ihor Sobchenko (1) , Dietmar Baither (2) , Rudolf Reichelt (1) , Eckhard Nembach (2)

1 Institut fuer Medizinische Physik und Biophysik
2 Institut fuer Materialphysik

Kinetic Monte Carlo simulations of the chemical and electrolytic etching processes of nano scale particles in two phase materials have been performed. Etching produces a surface relief, which can subsequently be studied by optical, scanning electron, and atomic force microscopy to obtain quantitative information on the size, shape, and spatial arrangement of the particles. The present simulations yield insight into the dependence of the etched relief on the strengths of the atomic bonds in the two phases and on the shape of the particles. Lower limits for the difference in bond energies necessary (i) to reveal the particles and (ii) to avoid over etching are established. The results of the simulations are discussed with reference to actual etching experiments performed for nano scale precipitates.

Mots clés: Physical Sciences

Ihor Sobchenko, Dietmar Baither, Rudolf Reichelt, Eckhard Nembach. Modeling and kinetic Monte Carlo simulations of the metallographic etching process of second phase particles. Philosophical Magazine, 2010, 90 (05), pp.527-551. ⟨10.1080/14786430903201846⟩. ⟨hal-00560311⟩